Features
| Temperature range | 20°C – 300°C |
| Temperature Controller | Single set point PID |
| Atmosphere | vacuum |
| Maximum Substrate size | 400 mm |
| Resolution | ±0.5 °C |
| Max vacuum | 40 mTorr |
Vacuum Oven – YES
YES Vacuum Convection Oven can be used to cure polyimide films on only Silicon and quarts/glass substrates in an O2 and H2O free environment. Any other substrate or materials must be approved by the staff before use.
Instrument Details
YES Vacuum Convection Oven
Facility Contact
Main Contact: Anil Dhote, PhD
Office: Cook Hall, #4087
(847) 491-5959 / email