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Facility

Keck-II

Spectroscopic Ellipsometer


Elipsometer

J.A. Woollam M2000U

245-1000nm, 470 wavelengths

Enhanced UV coverage down to 245nm. Ideal for many thin films: dielectrics, organics, semiconductors, metals, and more. Use it to measure optical constants and thickness for coatings from sub-nanometer to tens of microns.

Ellipsometry measures a change in polarization as light reflects or transmits from a material structure. The polarization change is represented as an amplitude ratio, Ψ, and the phase difference, Δ. The measured response depends on optical properties and thickness of individual materials. Thus, ellipsometry is primarily used to determine film thickness and optical constants. However, it is also applied to characterize composition, crystallinity, roughness, doping concentration, and other material properties associated with a change in optical response.